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Short-term copper intrauterine device placement improves the implantation and pregnancy rates in women with repeated implantation failure

Short-term copper intrauterine device placement improves the implantation and pregnancy rates in women with repeated implantation failure
To study if hysteroscopy and short-term copper intrauterine device placement (Cu-IUD) improves the pregnancy rates of women with repeated implantation failure (RIF) undergoing frozen-thawed embryo transfer (FET).
Source: fertstert.org

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